http://www.eeel.nist.gov/812/conference/
Frontiers of Characterization and Metrology for Nanoelectronics
March 27-29, 2007
Gaithersburg, Maryland
National Institute of Standards and Technology (NIST)
View the Conference Program!
Confirmed speakers for the 2007 conference include:
Yuji Awano, Fujitsu Laboratories Ltd., Atsugi, Japan
Sanjay Banerjee, University of Texas at Austin, Austin, TX
Chris Bevis, KLA-Tencor, San Jose, CA
Dawn Bonnell, University of PA, Philadelphia, PA
John Boland, Trinity College, Dubland, Ireland
Michel Brillouett, CEA/LETI, Grenoble, France
Jim Chelikowsky, University of Texas at Austin, Austin, TX
Yannick De Wilde, CNRS, France
Alain Diebold, SEMATECH, Austin, TX
Mark Durcan, COO, Micron, Boise, ID
Peter Eckland, Penn State, State College, PA
Peter Ercius, Cornell, Ithaca, NY
Mike Garner, Intel, Santa Clara, CA
Michael Hecker, AMD, Dresden, Germany
Dan Hutcheson, VLSI Research, Santa Clara, CA
William A. Jeffrey, Director, NIST, Gaithersburg, MD
David Joy, University of TN, Knoxville, TN
Patrick Leduc, CEA/LETI, Grenoble, France
Mark Lundstrom, Purdue, West Lafayette, IN
Toshihiko Kanayama, AIST, Onogawa, Japan
Tom Kelly, Imago, Madison, WI
Stephen Knight, NIST, Gaithersburg, MD
Kathryn Moler, Stanford University, Stanford, CA
John Notte, ALIS, Peabody, MA
Jimmy Price, SEMATECH, Austin, TX
Tom Theis, IBM, Yorktown Heights, NY
Anand Vairagar, AMD, Dresden, Germany
Wilfried Vandervorst, IMEC, Leuven, Belgium
Hisatsune Watanabe, President and CEO, Selete, Tsukuba, Japn
Jeff Welser, SRC, Research Triangle Park, NC
Caroline Whelan, IMEC, Leuven, Belgium
Obert Wood, Advanced Micro Devices, Albany, NY
Stefan Zollner, Freescale, Austin, TX
The 2007 International Conference on Frontiers of Characterization and
Metrology for Nanoelectronics (formerly titled Characterization and Metrology
for ULSI Technology) will be held in March 27-29, 2007 at the National
Institute of Standards and Technology (NIST), Gaithersburg, Maryland. This
conference, the sixth in the series, represents a paradigm shift from the
previous conferences in that emphasis is on frontiers and innovation in
characterization and metrology.
Please check this site frequently, as more details will become available in
the coming weeks.
For more information on the proceedings of our most recent conference, please
visit the American Institute of Physics (AIP).
Committee Co-Chairs
David Seiler, NIST
Alain Diebold, SEMATECH
Bob McDonald, METARA, INC. (Treasurer)
Mike Garner, INTEL
Dan Herr, SRC
Rajinder Khosla, NSF
Committee Members
Caroline Ayre, Intel
Alexander Braun, Semiconductor International
Dick Brundle, C. R. Brundle and Associates
Amal Chabli, LETI
C. Rinn Cleavelin, Texas Instruments
Michael Current, Frontier Semiconductor
Dick Hockett, Evans Analytical Group LLC
Toshihiko Kanayama, AIST
Stephen Knight, NIST
David Kyser, Applied Materials
Shifeng Lu, Micron
Ulrich Mantz, Zeiss
Bob Mazur, Solid State Measurements
Lori S. Nye, Entegris
Sandip Tiwari, Cornell University
Victor Vartanian, Freescale
Wilfried Vandervorst, IMEC
Bettina Weiss, SEMI
Ehrenfried Zschech, AMD
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