http://www.eeel.nist.gov/812/conference/
Frontiers of Characterization and Metrology for Nanoelectronics
(week of) May 11-15, 2009
College of Nanoscale Science and Engineering, University at Albany, Albany, NY
Abstract Deadline is December 17th!
Confirmed Speakers
Sitaram Arkalgud, SEMATECH
Dirk Beernaert, European Nanoelectronics Initiative Advisory Council
Pierre Bleuet, ESRF
Amal Chabli, CEA-DRT-LETI
Alain Diebold, University of Albany
Bruce Doris, IBM
Thomas Ernst, CEA-LETI
Hongjun Gao, Institute of Physics, Chinese Academy of Sciences
Holm Geisler, AMD Saxony Manufacturing GmbH
Greg Hughes, SEMATECH
Martin Hytch, CEMES-CNRS
Alain Kaloyeros, College of Nanoscale Science and Engineering, Univ. at
Albany
Christian Kisielowski, National Center for Electron Microscopy, Lawrence
Berkeley National Laboratory
Koji Kuroda, Dai Nippon Printing
Ji Ung Lee, College of Nanoscale Science and Engineering, Univ. at Albany
Mark Lundstrom, Purdue University
Jens Martin, Weizman Institute
Meyya Meyyapan, Center for Nanotechnology, NASA, Ames Research Center
Chris Ober, Department of Material Science and Engineering, Cornell
Hideo Ohno, Tohoku University
Wolfgang Osten, Institute of Technical Optics (ITO) Stuttgart
Michael Postek, NIST
Derk Rading, ION-TOF-GmbH
Bart Rijpers, ASML
Michael Steigerwald, Carl Zeiss
Hans Stork, Applied Materials, Inc.
Brad Thiel, University at Albany - SUNY
Wilfried Vandervorst, IMEC
Bertrand Vilquin and Brice Gautier, Nanotechnology Institute of Lyon
Francois Vurpillot, Institut des Materiaux, UFR Sciences et Techniques
Jeff Welser, Semiconductor Research Corporation
Konrad Winkler, Omicron NanoTechnology GmbH
Wenbing Yun, Xradia Inc.
The 2009 International Conference on Frontiers of Characterization and
Metrology for Nanoelectronics (formerly titled Characterization and Metrology
for ULSI Technology) will be held the week of May 11-15, 2009, at the College
of Nanoscale Science and Engineering, University at Albany, Albany, New York.
This conference, the seventh in the series, focuses on the frontiers and
innovation in characterization and metrology of nanoelectronics.
For details on the proceedings of our previous conferences, please visit the
American Institute of Physics (AIP).
Committee Co-Chairs
David Seiler, NIST
Alain Diebold, University at Albany
Bob McDonald, Technology Associates (Treasurer)
Mike Garner, Intel
Dan Herr, SRC
Rajinder Khosla, NSF
Committee Members
Caroline Ayre, Numonyx
Harold Bloess, Qimonda
Alexander Braun, Semiconductor International
Amal Chabli, LETI
Michael Current, Frontier Semiconductor
Dick Hockett, Evans Analytical Group LLC
Toshihiko Kanayama, AIST
David Kyser, Applied Materials
Shifeng Lu, Micron
Ulrich Mantz, Zeiss
Lori S. Nye, Brewer Science, Inc.
Yaw Obeng, NIST
Sandip Tiwari, Cornell University
Victor Vartanian, ISMI
Wilfried Vandervorst, IMEC
Bettina Weiss, SEMI
Ehrenfried Zschech, AMD
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