台積電延遲高- k -嗎？

[wrltertina (小妹)]

※ [本文轉錄自 Tech_Job 看板]

作者: wrltertina (小妹) 看板: Tech_Job
標題: 台積電延遲高- k -嗎？
時間: Wed Aug  5 16:35:44 2009

As reported, TSMC is struggling to ramp up its 40-nm process, due to yield issues.據報導，台積電正努力加大其40納米工藝，由於產量的問題。 Now, TSMC appears to have delayed its high-k/metal-gate technology.現在，台積電似乎已經推遲了high-k/metal-gate技術。 Originally, TSMC's high-k/metal-gate offering was slated for the first quarter of 2010, according to the firm.最初，台積電的high-k/metal-gate提供預定第一季度到2010年，該公司。 That technology is slated for its 28-nm node.該技術是將其28納米節點。 That
article can be read here.這一條可以讀取這裡。

        馬克LaPedus
Mark LaPedus 馬克LaPedus
Semiconductor Editor 半導體編輯
In a conference call this week, TSMC Chairman Morris Chang said that the company would ''tape-out'' 28-nm with high-k/metal-gate in ''late 2010'' or ''early 2011.'' Chang said that TSMC is engaged with 10 customers with its high-k.在一次電話會議上這個星期，台積電董事長張忠謀表示，該公司將''出帶'' 28納米與high-k/metal-gate在'' '' 2010年年底或2011年初'' 。 ''長他說，台積電正與10名顧客的高- k 。

For some time, there has been chatter that TSMC will ship its 28-nm process--without high-k--in the first part of 2010.一段時間以來，已有傳言，台積電將推出28納米工藝-不高- k -在第一部分的2010年。 So in that regard, TSMC's 28-nm offering is not late.所以在這方面，台積電的28納米技術可不能太晚。 However, TSMC's high-k is late to the party.但是，台積電的高- k是遲到了。 In comparison, IBM's ''fab club'' hopes to ship high-k by the end of 2009.相比之下， IBM的工廠俱樂部'' ''希望船高- k到2009年底。

This appears to confirm my suspicions that TSMC is struggling with high-k.這似乎證實了我的懷疑，台積電是掙扎的高- k 。 ''TSMC has also not really mastered the art of 'high-k/metal gate fabrication,' '' said CJ Muse, an analyst with Barclays Capital, in a recent report. ''台積電還沒有真正掌握了最先進的' high-k/metal閘門製造， ' ''說希傑繆斯的分析師巴克萊資本，在最近的一份報告。

''After delaying its implementation to 28-nm, TSMC is hedging its bets with a traditional oxynitride gate also available at 28-nm. ''後推遲至28日實施納米，台積電是對沖賭注與傳統的氮門也可以在28納米。 If, as suggested in trade publications such as those mentioned herein, the yield problem at 40-nm is due to leakage, then, at 28-nm, an oxynitride gate will expend even more power than a 40-nm chip, due to high severity leakage problems,'' he
said.如果中的建議，貿易出版物，如本文中提到，產量問題，在40納米是由於滲漏，然後，在28納米， 1氮大門將花費更多的權力甚至超過了40納米芯片，由於高嚴重滲漏問題， ''他說。 ''For gate engineering, Intel (mainly) and AMD, for years, had used KLA-Tencor's Quantox and had not taken the development of high-k/metal gate architecture lightly. ''門工程，英特爾公司（主要）和AMD公司，多年來，利用KLA - Tencor的Quantox並沒有採取發展high-k/metal門建築掉以輕心。 Now is the time that foundries are waking up to the
seriousness of the engineering challenges below 40-nm.''現在是時候說，代工是起床的嚴重程度，工程方面的挑戰低於40納米。 ''

KLA-Tencor's Quantox XP offers a gate monitoring solution for today's advanced gate dielectric processes. KLA - Tencor的Quantox XP中提供了一個閘門監控解決方案為當今的先進閘極電介質的過程。 Its ''ACTIV technology enables independent non-contact electrical test measurements of gate capacitance and leakage for in-line electrical process control,'' according to KLA-Tencor.其''主動技術使獨立的非接觸式電氣測試測量柵極電容和洩漏的在線電氣過程控制， ''據KLA - Tencor公司。

My theory: TSMC was working on its own high-k.我的理論：台積電正致力於自己的高- k 。 It didn't work.沒有奏效。 Then, it had to resort to ''Plan B.'' In April, ASMI announced that an undisclosed Taiwanese foundry has selected ASMI's Pulsar atomic layer deposition (ALD) tool for the volume manufacturing of its 28-nm node high-k gate dielectric process.然後，它不得不求助於'' ''計劃灣4月， ASMI宣布，台灣代工一個秘密選擇了ASMI的脈衝星原子層沉積（肝病）的工具，批量製造的28納米節點的高k柵介質進程。

Some speculated that the customer could be TSMC.有人推測，可能是台積電的客戶。 In any case, ASMI's Pulsar was the first tool to be used in volume manufacturing of high-k gates, starting at the 45-nm node.在任何情況下， ASMI的脈衝星是第一個工具，可用於大規模生產的高k門，開始在45納米節點。 ASMI's main high-k tool customer is Intel Corp. ASMI的主要高- k工具客戶英特爾

Another wild theory: Intel recently licensed its Atom IP to TSMC.另一個野生理論：英特爾最近的Atom的IP授權給台積電。 Intel and TSMC denied the deal involved high-k.英特爾和台積電否認參與處理高- k 。 Now, I'm really beginning to wonder if high-k is part of that deal.現在，我真的開始懷疑，如果高- k的一部分處理。

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